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Siloxane/Ozone Remover
- Model No.
- SFX
- Industry
- Semiconductor manufacturing process (post-process)
- Implementation
This remover is dedicated for the adsorption of siloxane and the decomposition of ozone.
With a high removal rate of 99%, compressed air and nitrogen gas can be used under pressurize.
- Documents / Download
PDF Catalog
Safety Precautions
User's Manual
CKD plus Members Only
- Features
[Removal of two types of contaminants]
Activated carbon element is used to either remove siloxane or ozone.[High pressure compatible]
Compressed air/nitrogen gas can be used under pressure.[High removal rate]
More than 99% siloxane adsorption and ozone decomposition performance.
[Space saving]
Modular connection to CKD preparation components enable reduced piping.
- Variations
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- Model No.SFX40-8
- Product name
- Siloxane/Ozone Remover
- Connection process
- Rc1/4
- Ambient and Fluid temperatures
- 5～50℃
- Remarks
- Model No.SFX40-10
- Product name
- Siloxane/Ozone Remover
- Connection process
- Rc3/8
- Ambient and Fluid temperatures
- 5～50℃
- Remarks
- Model No.SFX40-15
- Product name
- Siloxane/Ozone Remover
- Connection process
- Rc1/2
- Ambient and Fluid temperatures
- 5～50℃
- Remarks