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Siloxane/Ozone Remover
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- SFX
This remover is dedicated for the adsorption of siloxane and the decomposition of ozone.
With a high removal rate of 99%, compressed air and nitrogen gas can be used under pressurize.
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- Semiconductor manufacturing process (post-process)
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[Removal of two types of contaminants]
Activated carbon element is used to either remove siloxane or ozone.
[High pressure compatible]
Compressed air/nitrogen gas can be used under pressure.
[High removal rate]
More than 99% siloxane adsorption and ozone decomposition performance.
[Space saving]
Modular connection to CKD preparation components enable reduced piping.
| Model No. | Product name | Connection process | Ambient and Fluid temperatures | Remarks |
|---|---|---|---|---|
| SFX40-8 | Siloxane/Ozone Remover | Rc1/4 | 5～50℃ | |
| SFX40-10 | Siloxane/Ozone Remover | Rc3/8 | 5～50℃ | |
| SFX40-15 | Siloxane/Ozone Remover | Rc1/2 | 5～50℃ |
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